Intel begins mass production using world's first High-NA EUVIntel has moved its 18A node into high-volume production at Fab 52 in Arizona, using ASML’s first commercially deployed High-NA EUV tools to ramp advanced chipmaking in the U.S.The High-NA (0.55 NA) systems enable ~8nm single-exposure patterning that can reduce multi-patterning complexity, while 18A also adds RibbonFET gate-all-around transistors and PowerVia backside power delivery aimed at boosting performance-per-watt.External-customer momentum remains a key question after Reuters reported Nvidia paused 18A testing on Dec. 24, even as Intel points to interest from partners like Microsoft and the broader industry watches whether 18A can win foundry share from TSMC .

Intel begins mass production using world's first High-NA EUV

Intel has moved its 18A node into high-volume production at Fab 52 in Arizona, using ASML’s first commercially deployed High-NA EUV tools to ramp advanced chipmaking in the U.S.

The High-NA (0.55 NA) systems enable ~8nm single-exposure patterning that can reduce multi-patterning complexity, while 18A also adds RibbonFET gate-all-around transistors and PowerVia backside power delivery aimed at boosting performance-per-watt.

External-customer momentum remains a key question after Reuters reported Nvidia paused 18A testing on Dec. 24, even as Intel points to interest from partners like Microsoft and the broader industry watches whether 18A can win foundry share from TSMC
.